High Purity Zirconium Sputtering Target

Zirconium target related shapes Purity: ≥99.5% Standard: ASTM B551, GB/T8769-2010 Density: ≥6.51g/cm3 Melting point: 1852℃ Grain size: <100um Supply status: polished surface, polished surface, machined surface   Zirconium target preparation process Material preparation - electron beam melting - chemical analysis - forging - rolling - annealing - metallographic inspection - machining - size inspection - cleaning - final inspection - packaging   Application of zirconium sputtering target Widely used in thin film deposition, fuel cells, decoration, semiconductors, displays, LEDs and photovoltaic devices, functional coatings and other optical information storage space industries, glass coating industries such as automotive glass and architectural glass, optical communications and other fields.Zirconium target picture display We only produce high-purity zirconium target products. If you have product needs, please contact us for consultation. We can provide you with very…